Thin film transistor array substrate and fabricating method...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

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Details

C438S129000, C438S149000, C438S157000, C257SE21370, C257SE21409, C257SE21412

Reexamination Certificate

active

07625770

ABSTRACT:
A liquid crystal display and a fabricating method thereof for improving an aperture ratio are disclosed. A liquid crystal display (LCD) according to the present invention includes a gate line, a data line and a common line on the thin film transistor array substrate, the gate line crossing the data line to define a pixel region; a thin film transistor near the crossing of the gate line and the data line; a common electrode connected to the common line in the pixel region; and a pixel electrode connected to the thin film transistor in the pixel area for forming an in-plane electric field in association with the common electrode during an operation of the LCD, wherein an edge of the pixel electrode overlaps the common line with at least one insulating layer therebetween, and an edge of the common electrode overlaps the pixel electrode with said at least one insulating layer therebetween.

REFERENCES:
patent: 6506617 (2003-01-01), Cheng
patent: 6906770 (2005-06-01), Kim et al.
patent: 2004/0125260 (2004-07-01), Kim et al.
patent: 2004/0263751 (2004-12-01), Kim et al.
patent: 2005/0128410 (2005-06-01), Lee

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