Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...
Reexamination Certificate
2006-08-29
2006-08-29
Abraham, Fetsum (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Field effect device in non-single crystal, or...
C257S059000, C257S347000
Reexamination Certificate
active
07098480
ABSTRACT:
Disclosed is a simplified method for manufacturing a liquid crystal display. A gate wire including a gate line, a gate pad, and a gate electrode are formed on a substrate. A gate insulating layer, a semiconductor layer, and an ohmic contact layer are sequentially deposited, and a photoresist layer is coated thereon. The photoresist layer is exposed to light through a mask and developed to form a photoresist pattern. At this time, a first portion of the photoresist pattern which is located between the source electrode and the drain electrode is thinner than a second portion which is located on the data wire, and the photoresist layer is totally removed on other parts. The thin portion is made by controlling the amount of irradiating light or by a reflow process to form a thin portion, and the amount of light is controlled by using a mask that has a slit, a small pattern smaller than the resolution of the exposure device, or a partially transparent layer. Next, the exposed portions of conductor layer are removed by wet etch or dry etch, and thereby the underlying ohmic contact layer is exposed. Then the exposed ohmic contact layer and the underlying semiconductor layer are removed by dry etching along with the first portion of the photoresist layer. The residue of the photoresist layer is removed by ashing. Source/drain electrodes are separated by removing the portion of the conductor layer at the channel and the underlying ohmic contact layer pattern. Then, the second portion of the photoresist layer is removed, and red, green, and blue color filters, a pixel electrode, a redundant gate pad, and a redundant data pad are formed.
REFERENCES:
patent: 6022753 (2000-02-01), Park et al.
patent: 6104462 (2000-08-01), Kurorati et al.
patent: 6124917 (2000-09-01), Fujioka et al.
patent: 6130443 (2000-10-01), Hong et al.
patent: 6255706 (2001-07-01), Watanabe et al.
patent: 6300152 (2001-10-01), Kim
patent: 6310672 (2001-10-01), Koike et al.
patent: 6674495 (2004-01-01), Hong et al.
patent: 08-339974 (1996-12-01), None
patent: 09-90415 (1997-04-01), None
patent: 11-153809 (1999-06-01), None
patent: 2000-66240 (2000-03-01), None
Patent Abstracts of Japan, Publication No. 1996-339974, Dec. 24, 1996, 1 p.
Patent Abstracts of Japan, Publication No. 1997-090415, Apr. 4, 1997, 1 p.
Kim Dong-Gyu
Yoon Jong-Soo
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