Thin film transistor and method of manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

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Details

C257S059000, C257S072000, C257S547000, C257SE21414, C257SE29147

Reexamination Certificate

active

08030654

ABSTRACT:
A thin film transistor comprising a gate electrode, a gate insulating layer, an active layer, and source and drain electrodes is provided. The gate electrode overlaps with a channel region of the active layer, the gate insulating layer is provided between the gate electrode and the active layer, the source and drain electrodes overlap a source region and a drain region of the active layer, respectively, and a thin film of SiNxor SiOxNythrough which electrons are allowed to tunnel is provided between the active layer and the source and drain electrodes.

REFERENCES:
patent: 2001/0007358 (2001-07-01), Nakahori et al.
patent: 2008/0121890 (2008-05-01), Yang et al.
patent: 1466017 (2004-01-01), None
patent: 1993-315616 (1993-11-01), None
patent: 1999-030267 (1999-04-01), None
patent: 10-0336890 (2003-06-01), None
patent: 10-0615205 (2006-08-01), None

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