Thin-film transistor and display device using oxide...

Active solid-state devices (e.g. – transistors – solid-state diode – Semiconductor is an oxide of a metal or copper sulfide

Reexamination Certificate

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C257S057000, C257S072000, C257SE29296, C257SE29006

Reexamination Certificate

active

07923723

ABSTRACT:
The thin-film transistor of the present invention has at least a semiconductor layer including: on a substrate, a source electrode, a drain electrode, and a channel region; a gate insulating film; and a gate electrode, wherein the semiconductor layer is an oxide semiconductor layer, and wherein the gate insulating film is amorphous silicon including at least O and N, and the gate insulating film has a distribution of an oxygen concentration in a thickness direction so that the oxygen concentration is high in the side of an interface with an oxide semiconductor layer and the oxygen concentration decreases toward the side of the gate electrode.

REFERENCES:
patent: 5773325 (1998-06-01), Teramoto
patent: 6087229 (2000-07-01), Aronowitz et al.
patent: 6132817 (2000-10-01), Tokutake et al.
patent: 6563174 (2003-05-01), Kawasaki et al.
patent: 7411209 (2008-08-01), Endo et al.
patent: 2001/0041250 (2001-11-01), Werkhoven et al.
patent: 2003/0218221 (2003-11-01), Wager, III et al.
patent: 2005/0127380 (2005-06-01), Kawasaki et al.
patent: 2005/0199959 (2005-09-01), Chiang et al.
patent: 2006/0113536 (2006-06-01), Kumomi et al.
patent: 2006/0175609 (2006-08-01), Chan et al.
patent: 2007/0194379 (2007-08-01), Hosono et al.
patent: 2002-076356 (2002-03-01), None
patent: 2003-086808 (2003-03-01), None
K. Nomura et al., “Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors”, Nature, vol. 432, Nov. 25, 2004, pp. 488-492.
Nkkei MicroDevices, Feb. 2006, Table 2 on p. 74 (with English translation thereof attached).

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