Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent
1993-06-09
1995-05-16
Limanek, Robert P.
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
257349, 359 59, H01L 2701
Patent
active
054163404
ABSTRACT:
Leakage current due to light incident upon the semiconductor layer which forms the channel of a TFT is eliminated. An insulating layer is formed between one of source and drain electrodes and the semiconductor layer over a distance which is longer than a hole-electron recombination distance, from all the edges of at least one of the source and drain electrodes of the TFT so that it overlaps the semiconductor layer.
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Atsumi Masakazu
Matsumoto Takeshi
Yoshida Toshihiko
Aker David
Drumheller Ronald L.
International Business Machines - Corporation
Limanek Robert P.
Tran Minhloan
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