Thin film transistor and active matrix liquid crystal display de

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material

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257349, 359 59, H01L 2701

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active

054163404

ABSTRACT:
Leakage current due to light incident upon the semiconductor layer which forms the channel of a TFT is eliminated. An insulating layer is formed between one of source and drain electrodes and the semiconductor layer over a distance which is longer than a hole-electron recombination distance, from all the edges of at least one of the source and drain electrodes of the TFT so that it overlaps the semiconductor layer.

REFERENCES:
patent: 4857907 (1989-08-01), Koden
patent: 4935792 (1990-06-01), Tanaka et al.
patent: 5047819 (1991-09-01), Tanaka et al.
patent: 5053347 (1991-10-01), Wu
patent: 5065202 (1991-11-01), Tanaka et al.
patent: 5111261 (1992-05-01), Tanaka et al.
patent: 5121177 (1992-06-01), Tanaka et al.
patent: 5187551 (1993-02-01), Shoji et al.
patent: 5191451 (1993-03-01), Katayama et al.

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