Thin film, thin film manufacturing method, thin film...

Details Thin film, thin film manufacturing method, thin film... Thin film, thin film manufacturing method, thin film...

2007-09-25

2007-09-25

Fletcher, III, William Philip (Department: 1762)

Coating processes

Nonuniform coating

C427S068000, C427S384000

Reexamination Certificate

active

10392287

ABSTRACT:
A thin film is formed from a solution including a component for forming the film and a solvent. By removing solvent molecules from the thin film until, effectively, none of the solvent molecules exist any longer in the atmosphere near the surface of the film while the atmosphere is at room temperature and a pressure 1 Pa or below, a thin film layer is formed from the solution including the film-forming component and the solvent. After the formation, vapor incursion from the solvent into subsequent processes is prevented.

REFERENCES:
patent: 5932309 (1999-08-01), Smith et al.
patent: 6623097 (2003-09-01), Okada et al.
patent: 11-054272 (1999-02-01), None
patent: 2001-102170 (2001-04-01), None
patent: 2001-167878 (2001-06-01), None
patent: 2001-341296 (2001-12-01), None
JPO machine translation of JP 2001-341296 (Dec. 2001).
Examination result issued in corresponding Japanese application.

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