Thin film thickness and optimal focus measuring using reflectivi

Details Thin film thickness and optimal focus measuring using reflectivi Thin film thickness and optimal focus measuring using reflectivi

1997-04-18

1999-10-19

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

G03F 900

Patent

active

059686901

ABSTRACT:
A method and system for measuring the thickness of a patterned film. In one embodiment, a first patterned film is impinged with electromagnetic radiation having a wavelength which varies within a given wavelength range. The electromagnetic radiation reflected from the first patterned film is measured. The thickness of the first patterned film is then measured using thickness measuring equipment. The determined thickness of the first patterned film is then correlated with the measured reflectance of the electromagnetic radiation from the first patterned film. A second patterned film is then impinged with electromagnetic radiation having a wavelength which varies within the given wavelength range. The electromagnetic radiation reflected from the second patterned film is measured. The present invention uses the previously determined correlation to determine the thickness of the second patterned film.

REFERENCES:
patent: 4680084 (1987-07-01), Heimann et al.
patent: 5452091 (1995-09-01), Johnson

Affiliated with

Also associated with

Rating

Thin film thickness and optimal focus measuring using reflectivi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film thickness and optimal focus measuring using reflectivi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film thickness and optimal focus measuring using reflectivi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2053798