Thin film techniques for fabricating narrow track ferrite heads

Details Thin film techniques for fabricating narrow track ferrite heads Thin film techniques for fabricating narrow track ferrite heads

1982-03-15

1983-03-01

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

204192E, 156643, C23C 1500

Patent

active

043753906

ABSTRACT:
A process for producing a reactive ion-etched structure with height and width dimensions of the order of 25 microns or less on a ferrite substrate surface is disclosed. A mask of positive water saturated photoresist is formed on the substrate. A metal taken from the group consisting of nickel and a nickel-iron alloy is plated through the mask. The photoresist mask is removed to leave a pattern in the plated metal. The ferrite substrate surface that is exposed by the pattern is reactive ion etched with a power density of >1w/cm.sup.2 and a bias voltage <-100 volts.

REFERENCES:
patent: 3808108 (1974-04-01), Herb et al.
patent: 3984300 (1976-10-01), Vanommeren
patent: 4124473 (1978-11-01), Lehmann
patent: 4256514 (1981-03-01), Pogge
patent: 4259433 (1981-03-01), Mizobuchi
patent: 4275286 (1981-06-01), Hackett
IBM Technical Bulletin vol. 24, No. 2, July 1981, p. 995, "Fabrication of Ferrite Magnetic Head".

Affiliated with

Also associated with

Rating

Thin film techniques for fabricating narrow track ferrite heads does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film techniques for fabricating narrow track ferrite heads, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film techniques for fabricating narrow track ferrite heads will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1459403