Optical: systems and elements – Prism – With reflecting surface
Patent
1988-06-08
1992-10-06
Wojciechowicz, Edward J.
Optical: systems and elements
Prism
With reflecting surface
357 237, 357 4, 359 59, H01L 2904
Patent
active
051537028
ABSTRACT:
This invention relates to a thin film semiconductor device and a method for fabricating it, and more particularly a thin film semiconductor device suitably applicable to a display device in an active matrix system and a method for fabricating it. In this invention, the structure of a thin film semiconductor device for improving the characteristic thereof and particularly the structure relative to the dominant orientation of a poly-Si film as an active layer of a thin film transistor (TFT) is disclosed. A method for fabricating a thin film semiconductor device which is capable of forming a poly-Si film at a relatively low process temperature is disclosed. Further, a display device in an active matrix system which provided high performance and high image quality is disclosed. The poly-Si film having a dominant orientation of (111) is formed by forming a poly-Si film on the semiconductor substrate at a temperature up to 570.degree. C. and annealing the substrate at a temperature up to 640.degree. C.
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Adachi Eimi
Aoyama Takashi
Kawachi Genshiro
Konishi Nobutake
Miyata Kenji
Hitachi , Ltd.
Wojciechowicz Edward J.
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