Chemistry: analytical and immunological testing – Process or composition for determination of physical state... – Surface area – porosity – imperfection – or alteration
Patent
1991-09-12
1993-09-28
Housel, James C.
Chemistry: analytical and immunological testing
Process or composition for determination of physical state...
Surface area, porosity, imperfection, or alteration
436 2, 436 4, 436175, 422292, 422301, 156626, 7386321, G01N 3100, A61L 200, H01L 21306
Patent
active
052486141
ABSTRACT:
A method for analyzing ultratrace amounts of impurities in thin films present on semiconductor wafers without destroying the semiconductor wafer is described. The wafer having thin films to be analyzed is positioned into a testing device or fixture having at least one fluid reservoir. The testing device is tightened and sealed to the wafer so that the fluid reservoir is open to the thin films on the wafer, but otherwise sealed to the ambient. A reagent fluid is provided in the reservoir which dissolves the thin films on the wafer and allowing sufficient time for the fluid to dissolve the thin films. A diluent is added to the reservoir and the fluids are mixed. The mixed fluids are sampled and analyzed to determine the chemical nature of the thin films on the wafer. Samples are removed from the test fluid reservoirs to be tested as in an ion chromatograph, after the quantitative test, the wafer can be tested for weight difference and thin film edge step height by precision balance and alpha step which can be correlated.
REFERENCES:
patent: 4512847 (1985-04-01), Brunsch et al.
patent: 4544446 (1985-10-01), Cady
patent: 4584886 (1986-04-01), Matasunaga et al.
patent: 4634497 (1987-01-01), Shimazaki
patent: 4996160 (1991-02-01), Hausman Hazlitt et al.
Housel James C.
Kim Christopher Y.
Saile George O.
Taiwan Semiconductor Manufacturing Company
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