Thin film resistance thermometer with a predetermined temperatur

Coating processes – Electrical product produced – Resistor for current control

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427125, 156656, 204192E, B05D 512

Patent

active

044697171

ABSTRACT:
A thin film resistance thermometer is manufactured to have a predetermined temperature coefficient of resistance while minimizing the amount of metal in the film. The process involves the production of a metal film deposit on an insulating substrate such that the film deposited has a bulk coefficient substantially higher than the desired coefficient with the film being deposited to a thickness that produces the desired coefficient.

REFERENCES:
patent: 3781749 (1973-12-01), Iles et al.
patent: 3864825 (1975-02-01), Holmes
patent: 4103275 (1978-07-01), Diehl et al.
patent: 4146957 (1979-04-01), Toenshoff
Davidse et al. IBM Tech Dis. Bul. vol. 9, No. 2, Jul. 1966.
Maissel et al. Handbook of Thin film Technology McGraw Hill Inc, N.Y., .COPYRGT.1970 pp. 18-25 to 18-29.
Holmes et al. Handbook of Thin Film Technology Electrochemical Publications, Glasgow, Scotland .COPYRGT.1976 pp. 268-269.

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