Thin-film permanent magnet and method of producing the same

Details Thin-film permanent magnet and method of producing the same Thin-film permanent magnet and method of producing the same

1983-02-23

1986-06-24

Sheehan, John P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192C, C23C 1400

Patent

active

045966460

ABSTRACT:
A thin-film permanent magnet which is made of a Co - Pt alloy containing 5-35 atomic-% of Pt. This thin-film permanent magnet can be readily produced by a sputtering method in which the ultimate pressure before the introduction of a sputtering gas is made 5.times.10.sup.-7 -1.times.10.sup.-4 Torr. Without any heat treatment, it has a coercivity of 2,000 Oe at the maximum and a remanence of about 8,000-about 18,000 G.

REFERENCES:
patent: 4164461 (1979-08-01), Schilling
patent: 4226681 (1980-10-01), Shirahata et al.
patent: 4328080 (1982-05-01), Harris
patent: 4400255 (1983-08-01), Kisner
patent: 4411963 (1983-10-01), Aine
patent: 4430183 (1984-02-01), Schuller et al.
patent: 4438066 (1984-03-01), Aboaf et al.
Metals Handbook, vol. 5, "Surface Cleaning, Finishing, and Coating", Oct. 1982, 9th ed., pp. 412-416.

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