Thin film pattern forming device and method

Details Thin film pattern forming device and method Thin film pattern forming device and method

2006-11-03

2010-11-16

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C438S771000, C977S720000, C977S777000, C977S787000, C977S858000

Reexamination Certificate

active

07834332

ABSTRACT:
A thin film pattern forming device includes a chamber case having an inner space communicated with the outside, a first fixing unit provided in the chamber case, a pattern electrode plate having a certain shape and fixed to the first fixing unit, and a second fixing unit provided in the chamber case and spaced apart from the pattern electrode plate. A substrate on which an inked metallic nano-material is deposited is received on the second fixing unit. The device also includes a power supply unit for supplying power to the first fixing unit and the second fixing unit, and a drying unit for drying the inked metallic nano-material patterned on the substrate.

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patent: 1511086 (2004-07-01), None
patent: 1660597 (2005-08-01), None
Chinese Office Action date Jan. 4, 2008.

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