Thin film of gallium oxide and method of producing the film

Details Thin film of gallium oxide and method of producing the film Thin film of gallium oxide and method of producing the film

1994-03-07

1995-12-12

Loney, Donald J.

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428702, 359580, 359586, B32B 1504, B32B 1706

Patent

active

054748518

ABSTRACT:
A thin film of gallium oxidized with oxygen is produced by reactive vapor depositing gallium in a vacuum with oxygen followed by tempering. The refractive index (n) lies in the range of 1.2 to 1.3.

REFERENCES:
patent: 4187336 (1980-02-01), Gordon
patent: 4331737 (1982-05-01), Nishizawa
patent: 4371587 (1983-02-01), Peters
patent: 4595634 (1986-06-01), Gordon
"CRC Handbook of Chemistry and Physics", 71st edition (1990 to 1991), CRC Press, Boca Raton USA, pp. 4-65.
"Optical Properties of Thin Films of Ga.sub.2 O.sub.3 " by P. Koukal et al. in Scripta Fac. Sci. Not. UJEP Brunensis, Physica 2, vol. 5, (1975), pp. 71 to 82.
"Gallium Oxide Thin Film by Reactive Vapour Deposition", by T. Hariu et al., Japanese Journal Applied Physics, vol. 16, (1977, No. 5, pp. 841 to 842).

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