Thin film, method and apparatus for forming the same, and...

Details Thin film, method and apparatus for forming the same, and... Thin film, method and apparatus for forming the same, and...

2005-09-13

2005-09-13

Meeks, Timothy (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S536000, C427S596000, C427S551000, C427S250000, C427S255600

Reexamination Certificate

active

06942903

ABSTRACT:
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.

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