Thin-film measurement resistor and process for producing same

Details Thin-film measurement resistor and process for producing same Thin-film measurement resistor and process for producing same

1994-03-03

1996-08-06

Hoang, Tu

Electrical resistors

With base extending along resistance element

338314, 29851, 174256, H01C 1012

Patent

active

055437753

ABSTRACT:
A process for producing a thin-film measurement resistor in which an electrically insulating work material with a low specific heat capacity serves as substrate material, a metal film, preferably platinum, being applied thereto. The lateral electrical resistor is then structured and trimmed by erosive after-treatment, and the metal film is passivated in a final process step. The resistor element reacts more quickly to changes in temperature, the cover layer is extremely resistant to corrosion, and the entire construction is simple to produce in that glass is used as a substrate material and is provided, before applying the metal film, with a bonding agent layer of Al.sub.2 O.sub.3 which is substantially thinner than the metal film. The metal film is then applied by evaporation and structured by sputter etching. Finally, the metal film is provided with a protective coat of SiO.sub.x.

REFERENCES:
patent: H546 (1988-11-01), Schnable et al.
patent: 3845443 (1974-10-01), Fischer
patent: 4139833 (1979-02-01), Kirsch
patent: 4227039 (1980-10-01), Shibasaki et al.
Copy of article titled: "Sensorenherstellung mit Dunnschichttechnik" (Bd. 40 (1987)Heft 7) by Jorg Muller (3 p.).
Copy of article titled: "Dunn--und Dickschichttechnologien fur die Sensorik" (Bd. 109 (1988) Heft 11) by Jorg Muller (5 p.).

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