Thin film manufacturing system

Details Thin film manufacturing system Thin film manufacturing system

1988-05-13

1989-12-19

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118 501, 427 541, C23C 1648

Patent

active

048875481

ABSTRACT:
A thin film manufacturing system comprises a reaction vessel with a window that is transparent to ultraviolet radiation; a means of exhausting gas from the reaction vessel to a reduced pressure condition, a means of introducing a gas into the reaction vessel to form a thin film, a source of ultraviolet radiation that activates the gas, and slits provided at a predetermined interval on the window that is transparent to ultraviolet radiation.

REFERENCES:
patent: 4767641 (1988-08-01), Kieser

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