Chemistry of inorganic compounds – Carbon or compound thereof – Elemental carbon
Reexamination Certificate
2006-01-03
2006-01-03
Padgett, Marianne (Department: 1762)
Chemistry of inorganic compounds
Carbon or compound thereof
Elemental carbon
C423S446000, C427S131000, C427S523000, C427S562000, C427S577000
Reexamination Certificate
active
06982071
ABSTRACT:
Ion beam-deposited, nitrogen-doped C:H films having substantially lower resistivities than undoped ion beam-deposited C:H films and suitable for use as hard, abrasion-resistant overcoat layers for magnetic recording media, such as hard disks, are formed by supplying a mixture of hydrocarbon and nitrogen gases to an ion beam generator. Nitrogen atom content of the films is controlled to within from about 5 to about 25 at. % by appropriate selection of the ratio of hydrocarbon gas flow to nitrogen gas flow. The resultant IBD i-C:HN films exhibit a reduced tendency for charge build-up thereon during hard disk operation by virtue of their lower resistivity vis-à-vis conventional a-C:H materials.
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Grannen Kevin J.
Gui Jing
Ma Xiaoding
McCann Jeffrey A.
Shows Mark A.
Padgett Marianne
Seagate Technology LLC
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