Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-04-19
1999-06-29
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429832, 156345, 2504921, 25049221, 25049222, 2504923, C23C 1454, C23F 102, G21K 510
Patent
active
059164247
ABSTRACT:
Thin-film magnetic recording heads and systems and processes for manufacturing the same are disclosed. In one embodiment, the invention is understood as a focused particle beam system that includes a pattern recognition element and that employs the pattern recognition element to image and analyze the pole-tip assembly footprint of a recording head and that employs a processor to generate instruction signals that direct a focused particle beam to remove selected portions of the recording head and thereby shape the pole-tip assembly of the recording head. The focused particle beam system provides a precision milling device that can employ the coordinate information to mill selectively the recording head and thereby shape the geometry of the pole-tip assembly footprint, including geometries that have contoured surfaces.
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Athas Gregory J.
Hill Raymond
Libby Charles J.
Mello Russell
Yansen Donald E.
McDonald Rodney G.
Micrion Corporation
Nguyen Nam
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