Thin film magnetic memory device and manufacturing method...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal

Reexamination Certificate

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Details

C438S003000, C438S240000, C257S421000, C257S295000

Reexamination Certificate

active

07015059

ABSTRACT:
A thin film magnetic memory device includes: a TMR element, provided on a main surface of a silicon substrate, operating as a memory element; a buffer layer having a first surface bringing into contact with the TMR element and a second surface, located on the side opposite to the first surface, having an area smaller than that of the first surface; and a bit line, formed of a conductor film and a barrier metal film that bring into contact with the second surface, extending in one direction so as to intersect the TMR element. Thereby, it is possible to provide a thin film magnetic memory device realizing miniaturization of the memory cell and, also, having a high reliability, and a manufacturing method therefor.

REFERENCES:
patent: 6768150 (2004-07-01), Low et al.
patent: 6780652 (2004-08-01), Lee
patent: 6916668 (2005-07-01), Spielberger et al.
patent: 6936479 (2005-08-01), Sharma
patent: P2002-204010 (2002-07-01), None
patent: P2002-305290 (2002-10-01), None

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