Thin film magnetic head including crater for recessed structure

Dynamic magnetic information storage or retrieval – Head – Core

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296037, 216 22, 216 41, G11B 531, B44C 122, C23F 100

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active

056571925

ABSTRACT:
A method for pattern-etching thick alumina layers in the manufacture of thin film heads (TFH) by using compatible metallic mask layers and an alumina etchant. The deep alumina etching facilitates the formation of precise craters for recessed structures. These can improve planarity and alleviate problems related to adverse topography and elevated features of TFH devices.

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