Thin film magnetic head fabrication method

Metal working – Method of mechanical manufacture – Electrical device making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2960317, G11B 5127

Patent

active

055310176

ABSTRACT:
A novel thin film magnetic head fabrication process is provided for fabricating a plurality of thin film magnetic head elements. The process begins with the selection of an appropriate wafer substrate of suitable size and quality. At least two primary sub-areas of the wafer substrate are designated as work areas for the deposition of magnetic recording transducer elements. The work areas have first and second end portions and are arranged in mutually adjacent relation along a shared boundary zone that extends in a first direction through the wafer substrate between the first and second end portions. The wafer substrate is populated with plural rows of magnetic recording transducer elements in the designated work areas such that the plural rows extend in a second direction that is substantially perpendicular to the first direction. The work areas are separated from the wafer substrate and magnetic transducer slider elements are fabricated from the plural rows of magnetic recording transducer elements. The process steps are such that they reduce the number of fabrication steps to a minimum while increasing the consistency of throat and stripe heights.

REFERENCES:
patent: 4251841 (1981-02-01), Jacobs
patent: 4333229 (1982-06-01), Ellenberger
patent: 4549238 (1985-10-01), Ertingshausen et al.
patent: 4689877 (1987-09-01), Church
patent: 4914868 (1990-04-01), Church et al.
patent: 5095613 (1992-03-01), Hussinger et al.
patent: 5177860 (1993-01-01), Yura et al.
patent: 5203119 (1993-04-01), Cole
patent: 5206181 (1993-04-01), Gross
patent: 5321882 (1994-06-01), Zarouri et al.
patent: 5340772 (1994-08-01), Rosstker et al.
patent: 5406694 (1995-04-01), Ruiz
"Floating Thin Film Head Fabricated by Ion Etching Method" by T. Nakanishi, K. Kogure, T. Toshima and K. Yanagisawa, IEE Transactions on Magnetics, vol. Mag.-16, No. 5 (Sep. 1980).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thin film magnetic head fabrication method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film magnetic head fabrication method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film magnetic head fabrication method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1497376

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.