Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2005-01-25
2005-01-25
Hassanzadeh, P. (Department: 1763)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C427S109000, C427S126300, C427S255190
Reexamination Certificate
active
06846428
ABSTRACT:
Metal oxide films such as lithium niobate are formed in an amorphous state on a substrate such as lithium niobate and can be readily etched by conventional liquid or dry etchants. The amorphous film may then be converted by annealing to a crystalline form well suited to formation of electro-optical devices.
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Chowdhury Aref
Joshkin Vladimir A.
Kuech Thomas F.
McCaughan Leon
Saulys Dovas A.
Culbert Roberts
Foley & Lardner LLP
Hassanzadeh P.
Wisconsin Alumni Research Foundation
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