Valves and valve actuation – With means to increase head and seat contact pressure – Gate valve
Patent
1995-07-31
1997-11-04
Fox, John
Valves and valve actuation
With means to increase head and seat contact pressure
Gate valve
251187, F16K 318
Patent
active
056830726
ABSTRACT:
A gate valve for a thin film forming apparatus. The gate valve includes two adjoining low-pressure chambers and a wall separating the two chambers. The wall includes an aperture and a thin plate for covering the aperture. The thin plate is movable in a direction substantially parallel to the plate surface. The gate valve further includes a voltage supply for applying a direct current between the thin plate and the wall.
REFERENCES:
patent: 4313815 (1982-02-01), Graves, Jr. et al.
patent: 4384918 (1983-05-01), Abe
patent: 4547247 (1985-10-01), Warrenback et al.
patent: 4715921 (1987-12-01), Maher et al.
patent: 4747577 (1988-05-01), Dimock
patent: 4756810 (1988-07-01), Lamont, Jr. et al.
patent: 4812712 (1989-03-01), Ohnishi et al.
patent: 4818326 (1989-04-01), Liu et al.
patent: 4824546 (1989-04-01), Ohmi
patent: 4851101 (1989-07-01), Hutchinson
patent: 4897171 (1990-01-01), Ohmi
patent: 4944860 (1990-07-01), Bramhall, Jr. et al.
patent: 5082242 (1992-01-01), Bonne et al.
patent: 5161774 (1992-11-01), Engelsdorf et al.
Ohmi Tadahiro
Shibata Tadashi
Umeda Masaru
Fox John
Ohmi Tadahiro
LandOfFree
Thin film forming equipment does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thin film forming equipment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film forming equipment will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1826793