Thin film forming apparatus using laser and magnetic field

Details Thin film forming apparatus using laser and magnetic field Thin film forming apparatus using laser and magnetic field

1996-08-07

1998-06-02

Evans, Geoffrey S.

Electric heating

Metal heating

By arc

B23K 2600, C23C 1428, C23C 1435

Patent

active

057603669

ABSTRACT:
A thin film forming apparatus using a laser includes a chamber (1), a target (5) placed therein, a laser light source (10) for emitting a laser beam to target 5, and a substrate holder (3). When the target is irradiated with a laser beam, a plume (15) is generated, and materials included in plume 15 are deposited on the surface of a substrate (2) held by the substrate holder (3). A magnetic field is generated to direct the plume. The magnetic field can be parallel to the surface of the substrate or in another embodiment a cusp magnetic field can be used (see FIG. 130).

REFERENCES:
patent: H872 (1991-01-01), Hendrizks
patent: 4275288 (1981-06-01), Makosch et al.
patent: 4636403 (1987-01-01), Fisanick et al.
patent: 4664769 (1987-05-01), Cuomo et al.
patent: 4701592 (1987-10-01), Cheung
patent: 4743463 (1988-05-01), Ronn et al.
patent: 4970196 (1990-11-01), Kim et al.
patent: 5015492 (1991-05-01), Venkatesan et al.
patent: 5037521 (1991-08-01), Nishikawa et al.
patent: 5049405 (1991-09-01), Cheung
patent: 5084300 (1992-01-01), Zander et al.
patent: 5097793 (1992-03-01), Shuhara et al.
patent: 5126165 (1992-06-01), Akihama et al.
patent: 5128214 (1992-07-01), Takayanagi et al.
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5159169 (1992-10-01), Nishikawa et al.
patent: 5212148 (1993-05-01), Roas
patent: 5415901 (1995-05-01), Tanaka et al.
Optical Wave Electronics, Corona Publishing Co., Ltd., pp. 278-286, Jiro Koyama et al.
"Epitaxial Growth of Thin Films of BaTio.sub.3 Using Excimer Laser Ablation," G.M. Davies et al., Appl. Phys. Lett., vol. 55, No. 2, Jul. 1989, pp. 112-114.
"Pulsed-Laser Evaporation Technique for Deposition of Thin Films: Physics and Theoretical Model," R.K. Singh et al., Physical Review B, vol., 41, No. 13, pp. 8843-8859, May 1990.
Patent Abstracts of Japan No. 4-83866.
Patent Abstracts of Japan No. 3-188274.
Patent Abstracts of Japan No.3-180466.
Patent Abstracts of Japan No. 3-68762.
Patent Abstracts of Japan No. 2-310363.
Patent Abstracts of Japan No. 2-298261.
Patent Abstracts of Japan No. 1-219155.
Patent Abstracts of Japan No. 1-208455.
Patent Abstracts of Japan No. 1-39371.
"Pulsed Laser Evaporation and Epitaxy of Thin Semiconductor Films," Dubowski, 1988, Butterworth & Co., Ltd.
"Superconductivity and crystallinity of Ba.sub.2 Y.sub.1 Cu.sub.3 O.sub.7-.delta. thin films prepared by pulsed laser deposition with substrate bias voltage," Izumi, J. Appl. Phys. 68(12), Dec. 15, 1990, pp. 6331-6335.
Greer, Proceedings of the Third Annual Conf. on Superconductivity and Applications, Buffalo, NY, Sep. 1989.
WPI Acc. No.: 96-075426/08, Abstract of JP 07331422 A (Toshiba).
WPI Acc. No.: 92-178985/22, Abstract of JP 04114904 (Sumitomo).
WPI Acc. No.: 90-188473/25 Abstract of JP 2122069 (Nippon Teleg & Teleph).
WPI Acc. No.: 90-161409/21, Abstract for JP 2104660 (Tohoku Elec Power Ltd), Tokyo Elec Power co., Inc. Dengen Kaihatsu KK.
WPI Acc. No.: 89-296941/41, Abstract for JP 1219155 (Mitsubishi Denki KK).
WPI Acc #91-137406/19, Unknown Publication Date, Abstract Translation of JP 3-75,362.

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