Thin film forming apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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Details

204298, 118718, 118719, C23C 1600

Patent

active

057387710

ABSTRACT:
There is provided a method and apparatus for producing a photovoltaic device which is excellent in conversion efficiency and economical efficiency of mass production. Such a photovoltaic device is produced by forming a first metal oxide film on a metal member by non-reactive sputtering, forming a second metal oxide film on the first metal oxide film by reactive sputtering, and forming a semiconductor on the second metal oxide film.

REFERENCES:
patent: 4419533 (1983-12-01), Czubatyj
patent: 4842705 (1989-06-01), Mueller
patent: 5230746 (1993-07-01), Wiedeman
patent: 5520740 (1996-05-01), Kanai
patent: 5529674 (1996-06-01), Hedgcoth

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