Thin film forming apparatus

Details Thin film forming apparatus Thin film forming apparatus

1989-12-11

1992-07-28

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429806, 20419231, 118723, C23C 1650

Patent

active

051338491

ABSTRACT:
An apparatus for forming a thin film has a vacuum container to which an active gas, an inert gas or a mixture thereof is introduced, and a source of evaporation from which a substance is evaporated. A counter electrode is disposed in the vacuum container for holding a substrate for forming a thin film thereon in such a manner as to be opposed to the source of evaporation. A grid is disposed between the source of evaporation and the counter electrode and having openings which allow the evaporated substance to pass therethrough. A filament for thermionic emission is disposed between the grid and the source of evaporation. A target is also disposed between the filament and the source of evaporation for emitting sputtered particles. A power source device establishes predetermined electric potential relationships between the grid, the filament, and the target.

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