X-ray or gamma ray systems or devices – Specific application – Fluorescence
Patent
1992-01-07
1994-04-19
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Fluorescence
378 49, 378 83, G01N 23223
Patent
active
053053664
ABSTRACT:
This invention relates to a method and apparatus for analyzing a plurality of elements that are present on the surface of a material of interest or in its neighborhood, as well as a thin-film forming apparatus that is capable of measuring the composition of a sample during thin film formation in the process of semi-conductor fabrication. The apparatus are characterized in that a detector is isolated from the light and heat generated in a sample making mechanism by means of a shield which is not only heat-resistant but also transmissive of fluorescent X-ray containing soft X-rays of 1 Kev and below and that a mirror for total reflection of X-rays which is equipped with slits capable of adjusting the incident and exit angles of fluorescent X-rays from the sample excited with an excitation source as well as the ranges of those angles is provided either at the entrance or exit of said shield or at both.
REFERENCES:
patent: 3663812 (1972-05-01), Koenig
patent: 4169228 (1979-09-01), Briska et al.
patent: 4256961 (1981-03-01), Shoji et al.
patent: 4271353 (1981-06-01), Ohtsuki et al.
"Chemical Analyses of Surfaces by Total Reflection Angle X-Ray Spectroscopy in RHEED Experiments" Hasegawa et al., Journal of Applied Physics, vol. 24, No. 6, Jun. 1985, pp. L387-L390.
Knoth & Schwenke "A New Totally Reflecting X-Ray Fluorescence Spectrometer w/Detection Limits" below 10-11 g, Institut fur Physi.
Kosaka Nobuyuki
Koshinaka Masao
Nakahara Takehiko
Tomoda Toshimasa
Church Craig E.
Mitsubishi Denki & Kabushiki Kaisha
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