Thin film forming apparatus

Details Thin film forming apparatus Thin film forming apparatus

1990-02-14

1991-02-05

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118725, C23C 1648

Patent

active

049895419

ABSTRACT:
A thin film forming apparatus includes, in addition to a material gas nozzle, a control gas nozzle for jetting a control gas flow which encircles a material gas flow jetted from the material gas nozzle against a substrate supported in a reaction chamber, so as to shape the material gas flow into the form of a beam.

REFERENCES:
patent: 3297501 (1967-01-01), Reisman
patent: 4147571 (1979-04-01), Stringfellow
patent: 4597983 (1986-07-01), Kuhne
patent: 4645687 (1987-02-01), Donnelly
patent: 4650693 (1987-03-01), Kuisl
Brodsky, IBM Tech. Dis. Bulletin, vol. 22, No. 8A, Jan. 1980.

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