Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is
Patent
1997-09-24
1998-12-08
Wojciechowicz, Edward
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
257 49, 257 51, 257 67, 257286, 257401, 257618, H01L 2972
Patent
active
058474064
ABSTRACT:
A thin film field effect transistor includes: a) a thin film channel region; b) a pair of opposing electrically conductive first and second source/drain regions adjacent the thin film channel region; c) a gate insulator and a gate positioned adjacent the thin film channel region for electrically energizing the channel region to switch on the thin film field effect transistor; d) the first source/drain region having a first thickness, the second source/drain region having a second thickness, the channel region having a third thickness; at least one of the first and second thicknesses being greater than the third thickness. Methods are disclosed for making thin field effect transistors.
REFERENCES:
patent: 4586064 (1986-04-01), Esser et al.
patent: 4988638 (1991-01-01), Huang et al.
patent: 5047360 (1991-09-01), Nicholas
patent: 5112765 (1992-05-01), Cederbaum et al.
patent: 5118639 (1992-06-01), Roth et al.
patent: 5213990 (1993-05-01), Rodder
patent: 5238857 (1993-08-01), Sato et al.
patent: 5241193 (1993-08-01), Pfiester et al.
patent: 5266507 (1993-11-01), Wu
patent: 5273921 (1993-12-01), Neudeck et al.
patent: 5279980 (1994-01-01), Hikichi et al.
patent: 5286659 (1994-02-01), Mitani et al.
patent: 5334862 (1994-08-01), Manning et al.
patent: 5366909 (1994-11-01), Song et al.
patent: 5411909 (1995-05-01), Manning et al.
patent: 5429062 (1995-07-01), Yang
patent: 5474941 (1995-12-01), Mitani et al.
patent: 5482870 (1996-01-01), Inoue
patent: 5498557 (1996-03-01), Negishi et al.
patent: 5521107 (1996-05-01), Yamazaki et al.
patent: 5541126 (1996-07-01), Muragishi
T. Hashimoto et al., "An 8 nm-thick Polysilicon MOS Transistor and Its Thin Film Effects", Ext. Abs--21st Conf. on Solid State Devices and Materials, Tokyo, Japan 1989, pp. 97-100.
Peters, Laura "SOI Takes Over Where Silicon Leaves Off"; Semiconductor Int'l., Mar. 1993, pp. 48-51.
Colinge, Jean-Pierre "Some Properties of Thin-Film SOI MOSFETs"; IEEE Circuites and Devices Magazine, 1987, pp. 16-20.
Wolf, Stanley, Ph.D., "Silicon Processing for the VLSI Era", vol. 2: Process Integration, 1990, pp. 66-67.
Dennison Charles H.
Manning Monte
Micro)n Technology, Inc.
Wojciechowicz Edward
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