Thin film etching method and method of fabricating liquid...

Details Thin film etching method and method of fabricating liquid... Thin film etching method and method of fabricating liquid...

2005-10-11

2009-02-17

Trinh, Michael (Department: 2822)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S030000, C438S149000, C257SE21416

Reexamination Certificate

active

07491557

ABSTRACT:
A thin film etching method includes forming a layer on a substrate, aligning a mask having a pattern defined thereon above the layer, and removing a portion of the layer by irradiating the substrate with a femtosecond laser through the mask.

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Y. Nakata, T. Okada, M. Maeda: “Micromachining of a thin film by laser ablation using femtosecond laser with masks”, Optics&Laser Engineer, (2004) 389-93.
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Yang, Jianjun, Femtosecond Laser “Cold” Micro-Machining and Its Advanced Applications, School of Engineering and Technology, vol. 41, No. 3, (Mar. 2004), pp. 42-45, 57.

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