Semiconductor device manufacturing: process – Making passive device – Resistor
Reexamination Certificate
2005-07-12
2005-07-12
Fourson, George (Department: 2823)
Semiconductor device manufacturing: process
Making passive device
Resistor
C438S384000, C438S712000, C438S745000
Reexamination Certificate
active
06916720
ABSTRACT:
A method for making a thin film device on integrated circuits including the steps of applying a first photoresist layer to a first surface, and patterning the first photoresist layer to have at least a first opening that exposes the first surface. A film is deposited onto the first photoresist layer, wherein a portion of the deposited film is deposited onto the exposed first surface. A second photoresist layer is applied onto the deposited layer, wherein the second photoresist layer is applied to the portion of the deposited film within the first opening and covers a second portion of the deposited layer, wherein the first photoresist layer and the second photoresist layer assist in the defining of the deposited layer. The deposited layer, first photoresist layer, and second photoresist layer are selectively removed, therein exposing the first surface and the second portion of the deposited layer.
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Fields Charles H.
Kiziloglu Kursad
Schmitz Adele E.
Estrada Michelle
Fourson George
Gates & Cooper LLP
Hughes Electronics Corporation
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