Semiconductor device manufacturing: process – Manufacture of electrical device controlled printhead
Reexamination Certificate
2006-06-27
2006-06-27
Chaudhari, Chandra (Department: 2891)
Semiconductor device manufacturing: process
Manufacture of electrical device controlled printhead
C438S149000
Reexamination Certificate
active
07067337
ABSTRACT:
Any one of an insulating film forming a TFT, a silicon film and a conductive film is formed by applying a solution and annealing it. In a spin coater (102), a coating solution containing a thin film component which is supplied from a solution storage section (105) is spin-coated onto a substrate. The substrate after coating the coating solution is annealed in an annealing section (103) to form a coating film on the substrate. Additional laser annealing improves one of film characteristics, i.e., crystallinity, density and adhesiveness. Application of the coating solution or a resist by an ink jet process increases utilization of the solution and permits forming a patterned coating film. Because a thin film device in accordance with the present invention is inexpensive and has a high throughput, TFT production by a production system having high utilization of the coating solution drastically reduces initial investment and production cost of a liquid crystal display device.
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Kanbe Sadao
Miyazawa Wakao
Shimoda Tatsuya
Yudasaka Ichio
Chaudhari Chandra
Oliff & Berridg,e PLC
Seiko Epson Corporation
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