Thin film deposition using plasma-generated source gas

Details Thin film deposition using plasma-generated source gas Thin film deposition using plasma-generated source gas

1984-04-25

1985-03-19

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 39, 427 531, B05D 306

Patent

active

045059497

ABSTRACT:
An apparatus and method for depositing a layer of a surface-compatible material from the gas phase onto a selected surface area of a substrate body using a plasma adjacent the substrate body to create a source gas which is decomposed by a laser or other source of energy on the selected surface area. The plasma-generated source gas may be varied by changing targets within the plasma or the reactant gases, and the laser energy may cause decomposition of the source gas by photolysis or pyrolysis or a combination of both.

REFERENCES:
patent: 3364087 (1968-01-01), Solomon et al.
patent: 3419487 (1968-12-01), Robbins et al.
patent: 3472679 (1969-10-01), Ing et al.
patent: 4042006 (1977-08-01), Engl et al.
patent: 4183780 (1980-01-01), McKenna et al.
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4448801 (1984-05-01), Fukuda et al.

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