Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2011-01-11
2011-01-11
Cleveland, Michael (Department: 1712)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230DC, C118S7230AN, C118S7230EB, C118S7230VE, C118S7230CB, C204S298060
Reexamination Certificate
active
07866278
ABSTRACT:
A thin-film deposition system has a vacuum chamber and a plasma generator. The plasma generator includes a case, a cathode disposed in the case, an anode assembly disposed at an end of the case, a discharge power supply for applying a discharge voltage between the cathode and the anode assembly, and a gas supply means for supplying a discharge gas into the case. Electrons within a first plasma produced in the case are extracted into the vacuum chamber according to the discharge voltage. An evaporated material in a gaseous state inside the vacuum chamber is irradiated with electrons emitted from the plasma generator to produce a second plasma. The potential at the anode assembly is controlled by anode potential-controlling means such that the electrons within the second plasma are directed at the plasma generator and the ions within the second plasma are directed at the substrate.
REFERENCES:
patent: 4424104 (1984-01-01), Harper et al.
patent: 4890575 (1990-01-01), Ito et al.
patent: 5380683 (1995-01-01), Tyson et al.
patent: 5942854 (1999-08-01), Ryoji et al.
patent: 6211622 (2001-04-01), Ryoji et al.
patent: 2006/0177599 (2006-08-01), Madocks
patent: 2001143894 (2001-05-01), None
patent: 2003007240 (2003-01-01), None
Tohru Takashima, “Applications of High-Power Built-in Plasma Gun,” JEOL News, vol. 37E, No. 1 (2002), pp. 78-80.
Homma Yoshikazu
Takashima Toru
Chen Keath T
Cleveland Michael
Jeol Ltd.
The Webb Law Firm
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