Thin film deposition method of nitride semiconductor and...

Coherent light generators – Particular active media – Semiconductor

Reexamination Certificate

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C372S043010

Reexamination Certificate

active

06920166

ABSTRACT:
A masking material13, which includes stripe-like openings12parallel to the [1-100] direction of a nitride semiconductor thin film, is formed on a substrate. Nitride semiconductor thin films11doped with Mg are grown on the openings12by selective-area growth. The nitride semiconductor thin films11are composed of a portion14formed as a result of the growth in the direction perpendicular to a (0001) principal plane, and a portion15formed as a result of the growth of {11-2x} facets (x=0, 1, 2). The Mg concentration of the portion15is made lower than that of the portion14.

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