Coating processes – Optical element produced
Reexamination Certificate
2007-11-06
2007-11-06
Bashore, Alain L. (Department: 1762)
Coating processes
Optical element produced
C427S166000, C427S167000, C427S585000, C427S594000
Reexamination Certificate
active
10330385
ABSTRACT:
A thin film deposition method for producing an optical film with an optical characteristic on a deposition substrate in a vacuum chamber is provided. The method may include preparing in the vacuum chamber a deposition source which is a source of the film producing material; holding the deposition substrate with a substrate holding member; arranging the deposition substrate and the deposition source such that, given that a vertical distance from the center of the deposition substrate to the deposition source is defined as ZK and a horizontal distance between the deposition substrate and the deposition source as Xk, Xk/Zk is set to satisfy a following equation 0.48≦Xk/Zk≦0.78; rotating the deposition substrate on a rotational axis which is orthogonal to the deposition substrate; and evaporating the film producing material of the deposition source to perform deposition on the deposition substrate.
REFERENCES:
patent: 3892490 (1975-07-01), Uetsuki et al.
patent: 5505779 (1996-04-01), Mizuno et al.
patent: 5527417 (1996-06-01), Iida et al.
Abe Hiroyuki
Hiraizumi Atsushi
Masuda Koji
Mizuno Kazuyou
Shintomi Koichi
Bashore Alain L.
Cantor & Colburn LLP
The Furukawa Electric Co. Ltd.
LandOfFree
Thin film deposition method and thin film deposition apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thin film deposition method and thin film deposition apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film deposition method and thin film deposition apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3835345