Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1987-02-25
1988-08-16
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118715, 118723, 118733, 204298, 414217, C23C 1400, C23C 1600
Patent
active
047636025
ABSTRACT:
An apparatus for depositing thin films on a substrate includes at least one deposition module, a load lock module, a gate valve and a transportation mechanism for moving a substrate between the load lock and the at least one deposition module, the transportation mechanism being adapted to operate within ultra high vacuum conditions. The at least one deposition module is capable of maintaining an ultra high vacuum for depositing materials from reactive gases contained therein on a substrate. The load lock module is connected to the at least one deposition module by a gate valve and is capable of maintaining an ultra high vacuum. The transportation mechanism for moving the substrate between the load lock and the at least one deposition module is adapted to operate under ultra high vacuum conditions so that the substrate can be drawn from the load lock into the deposition module without breaking vacuum in the deposition module and contaminating the reactive gases contained therein. The apparatus is especially useful for manufacturing solar cells formed from doped amorphous silicon deposited from a glow discharge.
REFERENCES:
patent: 4498416 (1985-02-01), Bouchaib
patent: 4592306 (1986-06-01), Gallego
patent: 4666734 (1987-05-01), Kamiya
patent: 4674434 (1987-06-01), Ishihara
Madan Arun
Von Roedern Bolko
Bueker Richard
Glasstech Solar, Inc.
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