Thin film deposition apparatus and method

Details Thin film deposition apparatus and method Thin film deposition apparatus and method

1985-09-24

1987-05-12

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118730, 2041921, 204298, 4272555, B05D 306

Patent

active

046649352

ABSTRACT:
Apparatus and method for the deposition of a thin metal film on a surface of a workpiece as the workpiece is positioned adjacent to a deposition source and as the workpiece and deposition source rotate relative to each other about a first axis. The workpiece can also be moved relative to the deposition source about a second axis as the workpiece and the deposition source rotate relative to each other about the first axis. The distance between the workpiece and the deposition source can be adjusted.

REFERENCES:
patent: 3276902 (1966-10-01), Abraham
patent: 3391022 (1968-07-01), Saito
patent: 3464907 (1969-09-01), Froemel et al.
patent: 3573960 (1971-04-01), Duncan
patent: 3752691 (1973-08-01), Little
patent: 4599135 (1986-07-01), Tsunekawa et al.

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