Thin film deposition apparatus and method

Details Thin film deposition apparatus and method Thin film deposition apparatus and method

1987-05-06

1989-04-04

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

4272555, 118730, 2041921, 204298, B05D 306, C23C 1600, C23C 1400

Patent

active

048185612

ABSTRACT:
Apparatus and method for the deposition of a thin metal film on a surface of a workpiece as the workpiece is positioned adjacent to a deposition source and as the workpiece and deposition source rotate relative to each other about a first axis. The workpiece can also be moved relative to the deposition source about a second axis as the workpiece and the deposition source rotate relative to each other about the first axis. The distance between the workpiece and the deposition source can be adjusted.

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