Coating apparatus – With means to centrifuge work
Patent
1986-10-01
1988-12-13
Beck, Shrive
Coating apparatus
With means to centrifuge work
118 50, 118 58, 118320, 427240, 427377, 134 99, 134153, 269 21, B05C 1108
Patent
active
047902620
ABSTRACT:
A thin-film coating apparatus for coating a thin film on a material includes a casing, a spinner mounted in the casing for rotating the material, and a pipe disposed upwardly of the spinner and having in a lower end thereof a nozzle for dropping a film-forming coating solution onto the material. The casing comprises an annular upper plate, a cylindrical circumferential wall, and a bottom plate. The annular upper plate has defined therein gas flow passages for passage of an inert gas such as an N.sub.2 gas introduced from an exterior supply source, and gas ejector holes defined in the upper surface of the annular upper plate in communication with the gas flow passages for ejecting the inert gas toward the pipe.
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English Translation to Japanese Kokai Patent Publication No. 59-90928; USPTO, 8-18-87.
J. Holihan, Sr., et al., "Controlled Gap Photoresist Spinning Process", IBM Technical Disclosure Bulletin, vol. 17, No. 11, Apr. 1975, p. 3281.
Mizuki Hideyuki
Nakayama Muneo
Sago Hiroyoshi
Uehara Akira
Bashore Alain
Beck Shrive
Tokyo Denshi Kagaku Co., Ltd.
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