Semiconductor device manufacturing: process – Making passive device – Resistor
Reexamination Certificate
2007-07-17
2007-07-17
Nadav, Ori (Department: 2811)
Semiconductor device manufacturing: process
Making passive device
Resistor
C438S239000, C438S382000, C438S957000
Reexamination Certificate
active
10965071
ABSTRACT:
The present invention relates to a thin film circuit board device having passive elements in wiring layers. The thin film circuit board device includes a base board (2) and a circuit part (3) including insulating layers (11) and (16) and pattern wiring (14) and (17) formed on a build-up forming surface (2a). On the first insulating layer (11), a receiving electrode part (21) is formed and the passive elements electrically connected to the receiving electrode part (21) are formed. In the circuit part (3), a substrate titanium film and a substrate film are laminated so as to cover the receiving electrode part (21) and the passive elements respectively. The substrate film and the substrate titanium film in areas in which a metallic film is not formed are etched through the metallic film serving as the first pattern wiring (14) formed on the substrate film as a mask. Thus, a substrate layer (23) and a substrate titanium layer (22) are formed. Consequently, the substrate titanium film serving as the substrate titanium layer (22) prevents the corrosion of the receiving electrode part and the respective passive elements due to etching liquid to form the passive elements with high performance.
REFERENCES:
patent: 5757058 (1998-05-01), Song
patent: 6020643 (2000-02-01), Fukuzumi et al.
patent: 6362012 (2002-03-01), Chi et al.
patent: 06-140737 (1994-05-01), None
patent: 10-303566 (1998-11-01), None
Nadav Ori
Sonnenschein Nath & Rosenthal LLP
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