Thin film capillary process and apparatus

Details Thin film capillary process and apparatus Thin film capillary process and apparatus

2000-12-06

2003-11-18

Warden, Jill (Department: 1743)

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

C216S095000, C216S097000, C216S099000, C216S100000

Reexamination Certificate

active

06649078

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to microfluidic substrates, and more specifically, it relates to the formation of microfluidic capillaries.
BACKGROUND OF THE INVENTION
Microfluidic technology represents a revolution in laboratory experimentation. Microfluidic circuits allow for scientific experiments that used to be performed at the laboratory bench to be done in volumes as small as a nanoliter. Microfabrication makes it possible to create intricate designs of interconnected channels that are extremely small. Each pattern is designed to produce a series of fluid manipulation steps that will execute an experiment. Hoewever, current capillary electrophoresis on a chip often requires glass to glass or quartz to quartz bonding to form the interconnected channels.
SUMMARY OF THE INVENTION
Aspects of the present invention include a method comprising: depositing a first layer on a substrate surface; depositing a second layer on the first layer; depositing a third layer on the second layer; and removing the second layer to form a capillary between the first and third layers.
Further aspects of the present invention include an apparatus comprising: a substrate having a capillary lined with a material from the group consisting of glass, quartz, polysilicon, silicon nitride, silicon dioxide, and boron nitride/silicon dioxide.


REFERENCES:
patent: 4357205 (1982-11-01), Trausch et al.
patent: 4668374 (1987-05-01), Bhagat et al.
patent: 4716903 (1988-01-01), Hansen et al.
patent: 4758926 (1988-07-01), Herrell et al.
patent: 4791935 (1988-12-01), Baudino et al.
patent: 4860444 (1989-08-01), Herrell et al.
patent: 4903701 (1990-02-01), Moore et al.
patent: 4935040 (1990-06-01), Goedert
patent: 4938228 (1990-07-01), Righter et al.
patent: 4997537 (1991-03-01), Karger et al.
patent: 5039492 (1991-08-01), Saaski et al.
patent: 5086772 (1992-02-01), Larnard et al.
patent: 5102415 (1992-04-01), Guenther et al.
patent: 5112460 (1992-05-01), Karger et al.
patent: 5113869 (1992-05-01), Nappholz et al.
patent: 5199428 (1993-04-01), Obel et al.
patent: 5292340 (1994-03-01), Crosby et al.
patent: 5300093 (1994-04-01), Koestner et al.
patent: 5309919 (1994-05-01), Snell et al.
patent: 5312446 (1994-05-01), Holschbach et al.
patent: 5313953 (1994-05-01), Yomtov et al.
patent: 5365934 (1994-11-01), Leon et al.
patent: 5383512 (1995-01-01), Jarvis
patent: 5404877 (1995-04-01), Nolan et al.
patent: 5411031 (1995-05-01), Yomtov
patent: 5518001 (1996-05-01), Snell
patent: 5533957 (1996-07-01), Aldea
patent: 5575929 (1996-11-01), Yu et al.
patent: 5583281 (1996-12-01), Yu
patent: 5628917 (1997-05-01), MacDonald et al.
patent: 5641400 (1997-06-01), Kaltenbach et al.
patent: 5645564 (1997-07-01), Northrup et al.
patent: 5730187 (1998-03-01), Howitz et al.
patent: 5749900 (1998-05-01), Schroeppel et al.
patent: 5783452 (1998-07-01), Jons et al.
patent: 5836868 (1998-11-01), Ressemann et al.
patent: 5842787 (1998-12-01), Kopf-Sill et al.
patent: 5843118 (1998-12-01), Sepetka et al.
patent: 5882936 (1999-03-01), Bensten et al.
patent: 5895398 (1999-04-01), Wensel et al.
patent: 5911737 (1999-06-01), Lee et al.
patent: 5932799 (1999-08-01), Moles
patent: 6073482 (2000-06-01), Moles
patent: 6102917 (2000-08-01), Maitland et al.
patent: 6136212 (2000-10-01), Mastrangelo et al.
patent: 6176962 (2001-01-01), Soane et al.
patent: 6210986 (2001-04-01), Arnold et al.
patent: 6221654 (2001-04-01), Quake et al.
patent: 6258514 (2001-07-01), Montgomery
patent: 6331490 (2001-12-01), Stevens et al.
patent: 6423465 (2002-07-01), Hawker et al.
patent: 6437551 (2002-08-01), Krulevitch et al.
patent: 6485625 (2002-11-01), Simpson et al.
patent: 6497995 (2002-12-01), Skrobis
patent: 6498010 (2002-12-01), Fitzgerald et al.
patent: 19638501 (1998-04-01), None
patent: 633 468 (1994-05-01), None
patent: 668 500 (1995-02-01), None
patent: WO98/22811 (1998-05-01), None

Affiliated with

Also associated with

Rating

Thin film capillary process and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film capillary process and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film capillary process and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3168391