Thin film capacitor and method of manufacturing the same

Electricity: electrical systems and devices – Electrostatic capacitors – Fixed capacitor

Reexamination Certificate

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C361S321100, C361S321400, C361S303000, C361S305000, C361S311000, C361S313000

Reexamination Certificate

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10940605

ABSTRACT:
A semiconductor device having the thin film capacitor includes a first electrode formed on a substrate, a capacitor insulating film containing a laminated film, which is constructed by laminating an amorphous dielectric film and a polycrystalline dielectric film via a wave-like interface, on the first electrode, and a second electrode formed on the capacitor insulating film.

REFERENCES:
patent: 5717233 (1998-02-01), Fujii et al.
patent: 5739563 (1998-04-01), Kawakubo et al.
patent: 5978207 (1999-11-01), Anderson et al.
patent: 5986301 (1999-11-01), Fukushima et al.
patent: 6143597 (2000-11-01), Matsuda et al.
patent: 6190924 (2001-02-01), Lee
patent: 6323057 (2001-11-01), Sone
patent: 6335551 (2002-01-01), Takemura
patent: 6381119 (2002-04-01), Katori
patent: 6507476 (2003-01-01), Shaw et al.
patent: 6882516 (2005-04-01), Baniecki et al.
patent: 5-343254 (1993-12-01), None
patent: 9-36309 (1997-02-01), None
patent: 11-330391 (1999-11-01), None
patent: 2000-31403 (2000-01-01), None

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