THIN FILM APPARATUS, A MANUFACTURING METHOD OF THE THIN FILM...

Optical: systems and elements – Mirror – With support

Reexamination Certificate

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C349S045000, C438S778000, C257S382000, C257S411000, C257S412000, C257S413000

Reexamination Certificate

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06874898

ABSTRACT:
A manufacturing method of a thin film apparatus, includes: a first step for forming a separation layer on a heat resistant substrate; a second step for forming a thin film device on the separation layer; a third step for providing a surface layer on the thin film device; and a fourth step for generating a peeling phenomenon at the interface of the separation layer and the heat resistant substrate so as to peel the heat resistant substrate from a side of the thin film device.

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patent: 5729262 (1998-03-01), Akiyama et al.
patent: 6144082 (2000-11-01), Yamazaki et al.
patent: 6608357 (2003-08-01), Yamazaki et al.
patent: 6700631 (2004-03-01), Inoue et al.

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