Apparel – General structure
Patent
1996-12-19
1997-12-02
Vanatta, Amy B.
Apparel
General structure
2 69, 2 695, 2 97, 2272, 112420, 428 72, 428 76, 428102, 428220, 428 74, A41D 2702
Patent
active
056922450
ABSTRACT:
A thermally insulated down-fill fabric of reduced thickness and having a down-fill composition. A patterned envelope is formed and defines a pouch in which down or a down-fill composition is inserted and distributed substantially evenly within the envelope. The envelope is then compressed and stitch seams are formed to define a quilt pattern of closely spaced stitch lines to reduce the loft of the down-fill composition by about twice the normal loft thereof. This procedure is repeated over the entire envelope whereby the fabric has at least half the thickness of the normal loft of the down-fill composition.
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Houle Guy J.
Vanatta Amy B.
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