Thin dielectric film measuring system

Details Thin dielectric film measuring system Thin dielectric film measuring system

1988-03-14

1989-05-02

Willis, Davis L.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356357, 356369, G01B 902

Patent

active

048263214

ABSTRACT:
A system for the precise measurement of thin dielectric films on a substrate by directing a plane polarized laser light beam to the film at the Brewster angle of the substrate and by measuring the intensity changes between a measurement from the substrate alone and from the film coated substrate. Accurate thin film measurements in the range of from about 10 to 1,500 Angstroms are possible.

REFERENCES:
patent: 3985447 (1976-10-01), Aspnes
patent: 4105338 (1978-08-01), Kuroha
patent: 4606641 (1986-08-01), Yamada
patent: 4672196 (1987-06-01), Canino
Pliskin et al., "Simple Technique For Very Thin SiO.sub.2 Film Thickness Measurements", Applied Physics Letters, vol. 11, No. 8, pp. 252-259, 10/67.

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