Thickness measurement in an exposure device for exposure of...

Details Thickness measurement in an exposure device for exposure of... Thickness measurement in an exposure device for exposure of...

2006-05-23

2006-05-23

Luu, Thanh X. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C355S053000

Reexamination Certificate

active

07049617

ABSTRACT:
In an exposure device100having a vertically movable stage device120,and which performs exposure by projecting a pattern recorded on a hologram mask130onto a substrate to be exposed110on which is formed a photosensitive material film112and which is placed on the above stage device, a film thickness measurement mechanism160, 162measures the thickness of the photosensitive material film112,and based on the measured film thickness a light amount control mechanism162controls the amount of exposure light from the exposure light source140.An appopriate amount of light is set according to the film thickness, so that an accurate pattern can be formed in a single exposure pass.

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patent: 5877845 (1999-03-01), Makinouchi
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