Thick film drawing apparatus

Details Thick film drawing apparatus Thick film drawing apparatus

1990-03-20

1992-01-14

Housel, James C.

Coating apparatus

Immersion or work-confined pool type

Work-confined pool

118410, 118421, 118428, 118503, 118697, B05C 500, B05C 1300

Patent

active

050800361

ABSTRACT:
A thick film drawing apparatus includes a substrate holding member (50) for holding a substrate (a), moving coils (60) for holding the substrate holding member (50), a drawing head (20) having a nozzle (30) and a stylus (33) for emitting pastes for drawing on a surface of the substrate (a) moving thereon and pushing the substrate (a) downward, respectively, wherein in the drawing process the drawing head (20) is locked of up/down motions and the substrate holding member (50) is raised/lowered at substantially constant weaker force by the moving coils (60), and thereby a relative-moving response of the up/down directions of the nozzle (30) is improved and a contact force of the stylus (33) on the substrate (a) is kept under a predetermined constant value, therefore a thickness of thick film line (c) is kept uniform and circuit patterns are prevented from being flawed.

REFERENCES:
patent: 4592303 (1986-06-01), Wilbur, Jr.
patent: 4605569 (1986-08-01), Shimada et al.
patent: 4692351 (1987-09-01), Maeda et al.
patent: 4743465 (1988-05-01), Saeki et al.
patent: 4770120 (1988-09-01), Komatsu

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