Thick film copper conductor inks

Compositions – Electrically conductive or emissive compositions – Free metal containing

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252518, 252521, 106 113, 106 118, 501 19, 501 63, 501 69, 501 79, 501 70, H01B 106

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active

048805670

ABSTRACT:
Improved copper conductor inks useful in the fabrication of multilevel circuits are disclosed. The inks comprise copper powder, a devitrifying glass frit selected from a zinc-calcium-aluminum-silicate glass frit, a zinc-magnesium-barium-aluminum-silicate glass frit and mixtures thereof, an adhesion promoting oxide, and a suitable organic vehicle. These inks are particularly adapted for applications where superior adhesion between the copper conductor ink and the underlying substrate or dielectric film is required.

REFERENCES:
patent: 4376725 (1983-03-01), Prabhu et al.
patent: 4385127 (1983-05-01), Chyung
patent: 4415624 (1983-11-01), Prabhu et al.
patent: 4521329 (1985-06-01), Suita et al.
patent: 4574321 (1985-04-01), Suita
patent: 4623482 (1986-11-01), Kuo et al.
patent: 4816615 (1989-03-01), Prabhu et al.

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